Abstract
AbstractThe dependence of depth resolution Δz/z on the sputtering angle θ is investigated for three sputter‐deposited films: Cr (bee), SiNx (amorphous) and FeCoTb (amorphous). The depth resolution for the Cr system exhibits two maxima at θ = 35° and 45°. These are characteristic for bee textured material but different from fee textured material. The amorphous films show a very weak dependence, if any, owing to the absence of crystallites and crystalline texture. These results are in accordance with channeling theory.
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