Abstract

A theoretical study of the influence of word line and common source electrodes on the program operation in shrank SuperFlash memory is proposed. Numerical simulations demonstrate that the literature model defined for previous nodes is not always suitable, due to the continuous cell physical size reduction and to the consequent increment of capacitive coupling between the floating gate and adjacent electrodes. To get a deeper insight, an analytical model of the electric field in the region of source side injection is proposed. This model describes the impact of the cell physical and electrical parameters on the vertical and horizontal field components and highlights the strong dependence of the carrier injection on the technology node. Furthermore, the numerical and analytical models estimate the influence of the word line and common source electrodes on the time-to-program, the floating gate potential and the source side injection efficiency, taking into consideration, at the same time, their possible impact on the cell reliability.

Highlights

  • Operation in SuperFlash Memory.Electronic components are an important part of modern vehicles, and their role in the automotive industry is destined to grow with the gradual introduction of more and more sophisticated driver assistance systems (ADAS), setting the sight on full autonomous cars.For this reason, an increasing number of micro-controller units, together with embedded flash memory units are currently allocated in a vehicle [1]

  • 3a where the simulated EH curve is drawn as a function of th

  • Source Electrode coordinate x, in the portion delimited by word line (WL) and floating gate (FG) edges

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Summary

Introduction

Electronic components are an important part of modern vehicles, and their role in the automotive industry is destined to grow with the gradual introduction of more and more sophisticated driver assistance systems (ADAS), setting the sight on full autonomous cars. For this reason, an increasing number of micro-controller units, together with embedded flash memory units (eFlash) are currently allocated in a vehicle [1]. Due to their specific application, additional requirements are needed if compared with eFlashes in civil applications [2], i.e., high endurance, data retention and speed in program, erase and read operations [3].

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