Influence of change of imaging conditions on accuracy of optical measurement systems in industry

Abstract

Our work analyzes an influence of the change of imaging conditions on the accuracy of optical and optoelectronic measurement systems, which are used in various industrial branches, e.g. in mechanical engineering, optical industry, building industry, etc. It is shown that in case of the change of position of the measured object the imaging properties of the used optical measurement instrument are changed. This position change affects the image quality. If some optical measurement system is aberration free for a specified position of the measured object, then for other object positions the optical system has aberrations. The consequence of this effect is the change of the measurement accuracy for the specific optical system. The described effect is not removable on principle and it is necessary to take account to it in high accuracy measurements.