Influence of buffer layers on the deposition of high quality single crystal GaN over sapphire substrates

Abstract

Recently several research groups, including ours, have reported on the deposition of extremely high quality single crystal GaN layers over sapphire substrates. One of the keys to obtaining the high quality was the use of a thin AlN or GaN buffer layer between the sapphire substrate and the grown film. In this communication, we discuss the crystallinity and the influence of the buffer layer in controlling the crystalline, optical, and the electrical properties of the GaN depositions. We also compare the use of GaN and AlN as the buffer layer material. Our results indicate that the buffer layer thickness and the total film thickness are the key factors controlling the electrical, optical, and crystalline properties of the GaN depositions over sapphire substrates.