Influence of buffer gas pressure on the spectral width of the <inline-formula><math display="inline" overflow="scroll"><mrow><mn>510.6</mn><mtext>-</mtext><mi>nm</mi></mrow></math></inline-formula> line of an atomic copper vapor laser

Abstract

Abstract. The effect of buffer gas pressure on the intensity and thespectral width of the 510.6-nm line of an atomic copper vapor laser CVL is reported. A self-discharge heated CVL tube of internal diameter47 mm and length 1500 mm was used. The buffer gas pressure wasvaried from 5.0 to 470.0 mbar. A Fabry–Perot etalon-based setup wasused to measure and analyze the spectral width of 510.6-nm lines ofCVL. The relative intensity and spectral width of the hyperfine compo-nents changes with operating buffer gas pressure. The buffer gas pres-sure reduces the number of hyperfine components and hence overalllinewidth . © 2009 Society of Photo-Optical Instrumentation Engineers. DOI: 10.1117/1.3216574 Subject terms: copper vapor laser CVL ; hyperfine lines; linewidth; pressure . Paper 090226R received Apr. 1, 2009; revised manuscript received Jul. 1, 2009;accepted for publication Jul. 10, 2009; published online Sep. 3, 2009. 1 Introduction The copper vapor laser CVL is one of the most powerfuland efficient high-repetition-rate pulsed lasers in the visiblerange of the spectrum.