Abstract
Three-dimensional (3D) microstructures are fabricated in negative photoresist SU-8 through two-photon polymerization by direct laser writing using a femtosecond pulse laser. The influence of beam power and baking conditions on the obtained structures is investigated. X-ray photoelectron spectroscopy is used to characterize the crosslinking of SU-8 photoresist after two-photon polymerization. The baking time for prebaking at 65 °C and that for soft baking at 95 °C before laser irradiation are investigated. These conditions are significantly related to the migration of photoacid produced upon laser irradiation. 3D woodpiles, helixes, cylinders, jungle gyms, and double cubic structures are fabricated by controlling the micron scale movement in the X, Y, and Z-axis direction. With a small elevation angle, the overlap of helical lines induces the cylindrical wall structure. Double cubic structures are fabricated: small cubic structure inside the outer large cubic structure.
Highlights
Pioneering research on microfabrication using twophoton absorption1,2 opened a new field of direct laser writing (DLW) to fabricate microstructures under a microscope
The baking time for prebaking at 65 C and that for soft baking at 95 C before laser irradiation are investigated. These conditions are significantly related to the migration of photoacid produced upon laser irradiation. 3D woodpiles, helixes, cylinders, jungle gyms, and double cubic structures are fabricated by controlling the micron scale movement in the X, Y, and Z-axis direction
We studied the fabrication of three dimensional microstructures using a negative photoresist of SU-8 with photoacid through two-photon polymerization
Summary
Pioneering research on microfabrication using twophoton absorption opened a new field of direct laser writing (DLW) to fabricate microstructures under a microscope. Two-photon direct laser writing is a unique technique to fabricate the objects with microscale and nanoscale structures at a given position. Positive and negative photoresists are commonly used to fabricate microstructures on the micron-scale and the submicron-scale using a DLW method. Structuring of SU-8 photoresist by two-photon polymerization was well studied including the size of the line width and line height, which depends on the laser power.. Structures with arbitrary shapes by two-photon polymerization have been studied previously in a broad range of research fields.. We studied the fabrication of three dimensional microstructures using a negative photoresist of SU-8 with photoacid through two-photon polymerization. The effect of the baking conditions on the line (rod) structure and the wall structure in the obtained microstructures was discussed
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