Influence of Ar addition on ozone generation in a non-thermal plasma—a numerical investigation

Abstract

A numerical model based on a dielectric barrier discharge is developed in this study to investigate the influence of Ar addition on ozone generation. The simulation results show good agreement with the experimental data, confirming the validity of the numerical model. The mechanisms regarding how the Ar addition affects ozone generation are investigated with the assistance of a numerical simulation by probing into the following two questions, (1) why the ozone concentration just slightly decreases in the low specific input energy (SIE, the ratio of discharge power to gas flow rate) region even if the inlet O2 concentration is substantially decreased and (2) why the variation of the increased rate of ozone concentration with SIE (i.e. the variation in the slope of ozone concentration versus SIE) is more significant for an O2/Ar mixture plasma. As SIE is relatively low, ozone decomposition through electron-impact and radical attack reactions is less significant because of low ozone concentration and gas temperature. Therefore, the ozone concentration depends mainly on the amount of oxygen atoms generated. The simulation results indicate that the amount of oxygen atoms generated per electronvolt for Ar concentrations of 0%, 10%, 30%, 50% and 80% are 0.178, 0.174, 0.169, 0.165 and 0.166, respectively, explaining why the ozone concentration does not decrease linearly with the inlet O2 concentration in the low SIE region. On the other hand, the simulation results show that increasing Ar concentration would lead to a lower reduced field and a higher gas temperature. The former would lead to an increase in the rate constant of e + O3 → e + O + O2 while the latter would result in a decrease in the rate constant of O + O2 + M → O3 + M and an increase in that of O3 + O → 2O2. The changes in the rate constants of these reactions would have a negative effect on ozone generation, which is the rationale for the second question.