Abstract
A study of the influence of the formation regimes of avalanche LEDs based on nanostructured silicon on the parameters of the formed devices, such as the light emission voltage and the stability of operation has been performed. These parameters are an important factor for the practical use of avalanche LEDs in the development of silicon photonics products, the progress of which is associated with the future of integrated electronics. For the first time, the technological operation of local through electrochemical anodizing of aluminum in various electrolytes for the formation of a separating dielectric of Schottky contacts is presented. The influence of the built-in electric charge in the separation dielectric of silicon avalanche LEDs on their current-voltage characteristics is studied. It was found that the built-in negative electric charge increases the breakdown voltage of the Schottky contact, which results in an increase of the light emission efficiency of the diode structures. An explanation of this effect is presented on the basis that the built-in negative electric charge inside the anode oxide also creates a space charge region in silicon, which helps to reduce the effect of the concentration of field lines at the edges of diode structures, performing the function of protecting the Schottky contact from edge effects as well as protective areas do. It has been established that the highest avalanche breakdown voltage is observed in diode structures with anodic oxide formed in an electrolyte based on an aqueous solution of phosphoric acid. An analysis of the characteristics of LEDs at different temperatures of silicon substrates showed an increase of breakdown voltage with increasing temperature, which is typical for avalanche breakdown during impact ionization. Stable light emission of the formed LEDs was demonstrated in a wide range of operating voltages (8–16 V). The use of silicon avalanche LEDs both as discrete devices and in integrated electronics in general has been discussed.
Highlights
Silicon MOS optoelectronic micro-nano structure based on reverse-biased PN junction
Dolbik A.V., research worker of Lab. 4.12 of Belarusian State University of Informatics and Radioelectronics
Summary
ВЛИЯНИЕ АНОДНОГО ОКСИДА АЛЮМИНИЯ, ИСПОЛЬЗУЕМОГО В КАЧЕСТВЕ РАЗДЕЛИТЕЛЬНОГО ДИЭЛЕКТРИКА КРЕМНИЕВЫХ. Проведено исследование влияния режимов формирования лавинных светодиодов на основе наноструктурированного кремния на параметры формируемых приборов, такие как напряжение светоизлучения и стабильность функционирования, что является важным фактором для их практического использования при разработке изделий кремниевой фотоники, с развитием которой связывается будущее интегральной электроники. Обнаружено, что встроенный отрицательный электрический заряд увеличивает пробивное напряжение контакта Шоттки, что способствует увеличению эффективности светоизлучения диодных структур. Представлено объяснение данного эффекта на основе того, что встроенный отрицательный электрический заряд внутри анодного оксида создает также область пространственного заряда в кремнии, что способствует уменьшению эффекта концентрации силовых линий на краях диодных структур, выполняя функцию защиты контакта Шоттки от краевых эффектов по аналогии с охранными областями. Используемого в качестве разделительного диэлектрика кремниевых лавинных светодиодов, на их характеристики. Belarusian State University of Informatics and Radioelectronics, Minsk, Republic of Belarus
Sign-in/Register to view highlights & summary Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
