Abstract
Boron nitride films prepared by ion beam assisted deposition (IBAD) have been studied. The presence of the cubic phase was checked by HRTEM microscopy. The adhesion of the films was very poor and without a thin boron sublayer, the films delaminated just after deposition. In an attempt to improve the adhesion, post deposition annealing was performed. The structure and the stress of the films were followed by infrared spectroscopy (FTIR). Annealing carried out on c-BN films shows a thermal threshold of stability around 950 °C. These effects are discussed according to the proportion of the cubic phase present in the film.
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