Abstract
ABSTRACTFluoride-doped Tin Oxide (FTO) thin films were deposited on glass and silicon substrates by the sol-gel spin-coating method using stannic chloride pentahydrate (SnCl4·5H2O) and ammonium fluoride (NH4F) as starting precursors for Sn and F sources. As-deposited films were annealed at different temperatures ranging from 300–600°C. The effect of annealing temperature on structural and optical properties of FTO thin films including crystallinity, surface morphology, optical transparency, optical reflectivity and optical band gap are investigated by X-ray diffraction, scanning electron microscopy and UV-VIS spectrophotometry. The XRD results suggest that the prominent peak in the (110) orientation can be indexed to the polycrystalline SnO2 structure without any impurity phase caused by fluoride doping. The transmittance spectra of fluoride-doped tin oxide thin films show good transparency in the visible region with noticeable variation in its structural and optical reflectance properties depending on annealing temperature.
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