Abstract
In this paper, a fast and inexpensive wafer-scale process for the fabricationof arrays of nanoscale holes in thin gold films for plasmonics is shown. Theprocess combines nanosphere lithography using spin-coated polystyrene beadswith a sputter-etching process. This allows the batch fabrication of several1000 µm2 large hole arrays in 200 nm thick gold films without the use of an adhesion layer for the goldfilm. The hole size and lattice period can be tuned independently with this method.This allows tuning of the optical properties of the hole arrays for the desiredapplication. An example application, refractive index sensing, is demonstrated.
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