Inductively coupled reactive high-density plasmas designed for sputter deposition

Abstract

Two types of inductively coupled RF high-density plasmas designed for sputter deposition in an external magnetic field are studied experimentally. One is helicon wave excited plasma in a magnetic field for cylindrical target sputtering. The other is planar magnetron discharge assisted by an inductively coupled plasma. The plasmas are produced using helical antennas with azimuthal mode number of m =0. Plasma characteristics are studied in Ar and reactive gases such as N 2 , H 2 and/or O 2 . An RF wave field is measured and the excitation of helicon waves in a magnetic field is clarified in the production of high-density plasmas. Spectroscopic measurement of plasma emissions in the planar magnetron discharges indicates remarkable increase of ionization of sputtered particles when it is assisted by an inductively coupled plasma.