INDUCED PHOTO-DEGRADATION OF POLYSTYRENE BY USING NICKEL (II) - COMPLEX (NI-BAP)

Abstract

This study dealt with the photo degradation of polystyrene films after exposing them to light using Schiff's bases of nickel-complex, the films were made after mixing with the polymer solution at different weight percentages in the range (0.025%-0.4%) with thickness (60 ± 5) micron using chloroform. The specimens were irradiated for different times using the same light intensity (1.5x10-8 ein.dm3s-1) at wavelength (356nm) at 40˚C. The photo degradation of the prepared films with and without additives were followed by FT.I.R technique for evaluating both ICO and IOH . U.V-vis was used to calculate the rate of degradation. The results indicated that the synthesized complex has induced the degradation which increases as the concentration of the additives increase which coincides the results of Kd increase which followed in presence and without of 0.05% of the added Nickel- complex by measuring of the number-average molecular weight and the degree of decomposition, the chain mean scission and the quantum yield. it was found that in the presence of the metal complex the decrement in the molecular weight M.W) increased and chain scission as well in parallel with other results