Abstract
In recent years, the photodetectors gained much attention due to their wide range of applications in industry, military, space and biological fields. In this work, the metal-semiconductor-metal (MSM) photodetector was fabricated using In2S3 thin films with Al interdigitated electrodes. The In2S3 thin films were prepared by co-evaporation technique with various thicknesses in the range 130–700 nm at a constant substrate temperature of 350 °C. The structural, morphological, compositional, optical and electrical properties of In2S3 thin films were studied as a function of thickness. The energy band gap of films is found to be in the range 2.53–2.71 eV. I–V characteristics and photo response of photodetectors were recorded under UV and visible light illumination. The parameters of a photodetector such as photo sensitivity, responsivity and detectivity were calculated. The observed photo responsivity increases with increase of film thickness. The photo response of all photodetectors confirmed the stable and reproducible characteristics such as photo sensitivity, responsivity and detectivity.
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