Abstract

Control of the crystallization process is central to developing nanomaterials with atomic precision to meet the demands of electronic and quantum technology applications. Semiconductor nanowires grown by the vapor–liquid–solid process are a promising material system in which the ability to form components with structure and composition not achievable in bulk is well-established. Here, we use in situ TEM imaging of Au-catalyzed GaAs nanowire growth to understand the processes by which the growth dynamics are connected to the experimental parameters. We find that two sequential steps in the crystallization process—nucleation and layer growth—can occur on similar time scales and can be controlled independently using different growth parameters. Importantly, the layer growth process contributes significantly to the growth time for all conditions and will play a major role in determining material properties such as compositional uniformity, dopant density, and impurity incorporation. The results are understood through theoretical simulations correlating the growth dynamics, liquid droplet, and experimental parameters. The key insights discussed here are not restricted to Au-catalyzed GaAs nanowire growth but can be extended to most compound nanowire growths in which the different growth species has very different solubility in the catalyst particle.

Highlights

  • Control of the crystallization process is central to developing nanomaterials with atomic precision to meet the demands of electronic and quantum technology applications

  • In this study we have investigated in situ the nucleation and layer growth processes in VLS growth of GaAs nanowires

  • We observe that the nucleation and layer growth processes can be independent, occur on similar time scales and are controlled by different parameters for most of the growth parameter space

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Summary

Introduction

Control of the crystallization process is central to developing nanomaterials with atomic precision to meet the demands of electronic and quantum technology applications. We find that two sequential steps in the crystallization process nucleation and layer growth can occur on similar time scales and can be controlled independently using different growth parameters. In situ experiments at conditions similar to typical ex situ growths are necessary to understand the growth kinetics in the widely used conventional (ex situ) systems This understanding combined with the serial nature of the nucleation and incubation steps suggest the potential to separately access the parameters controlling them and to use this as a means to design material properties. Simulations of the growth show that the observed effects can be understood by considering the very different steady-state compositions of the two species (Ga and As) in the catalyst droplet during growth Since this effect is fundamental in nature, it can be directly extrapolated to other growth conditions, growth methods and other binary semiconductor materials

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