Abstract
The strength properties of FP9120, SPR 700 and S1813 G2 SP15 diazoquinone novolac photoresist films
 on silicon irradiated by 5 MeV electrons with a fluence of 3 1016 cm-2 were studied by indentation. Misprints of
 the microindenter in films of diazaquinone novolac photoresist are barrel-shaped, which indicates the presence
 of tensile stresses that form during film drying. A destruction zone with radial and lateral cracks was observed
 around the indenter prints, forming a pattern in the form of "butterflies". It has been established that during longterm
 storage and irradiation of films of diazoquinone novolac photoresists, an increase in the values of the true
 microhardness of the films takes place, which is due to the cross-linking of novolac macromolecules in the bulk
 of the polymer.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
