Abstract
Approaches to increase the efficiency of the use of materials that evaporate with subsequent deposition in a vacuum have been analyzed. The high efficiency and advantage of deposition from an evaporator with a directed vapor flow in a vacuum compared to a classical crucible evaporation scheme are shown. The optimal technological modes of deposition from the evaporator to achieve homogeneity of the directional steam flow were determined. The dependence between the temperature of the target, the efficiency of the evaporation scheme and the distance of the evaporator from the target was determined experimentally.
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