Increase of the resistivity of electroless-deposited high-B/sub s/ CoNiFeB thin films

Abstract

In order to increase the resistivity of electroless-deposited high-B/sub s/ CoNiFeB thin films, it was decided to investigate the effect of adding a /spl beta/-alanine containing complexing agent to the plating bath. The resistivity (/spl rho/) gradually increased as the /spl beta/-alanine concentration was increased. CoNiFeB thin films with desirable soft magnetic properties, B/sub s/ = 17-17.5 kG and H/sub c/ < 3.0 Oe, were obtained under these conditions with /spl rho/ value (70-90 /spl mu//spl Omega/ cm) dependent on carbon incorporation in the films. It has been suggested that carbon impurities in the films resulting from the use of the /spl beta/-alanine complexing agent containing -NH/sub 2/ group causes electron scattering, leading to an increase in the resistivity.