Abstract
A new gas sensor working in room temperature, which is compatible with silicon fabrication technology is presented. Porous silicon nanowires (NWs) were synthesized by metal-assisted chemical etching method and then TeO₂ NWs branches were attached to their stem by thermal evaporation of Te powders in the presence of air. Afterwards TeO₂ branched porous Si NWs were functionalized by Pt via sputtering followed by low temperature thermal annealing. Scanning electron microscopy, transmission electron microscopy and energy-dispersive X-ray spectroscopy collectively confirmed successful formation of TeO₂ branched porous Si NWs functionalized by Pt nanoparticles. Their gas sensing properties in the presence of CO, C6H6 and C7H8 were tested at room temperature, for Si wafer, pristine porous Si NWs, pristine TeO₂ branched porous Si NWs, and Pt functionalized TeO₂ branched porous Si NWs sensors. Pt functionalized TeO₂ branched porous Si NWs have higher responses to all tested gases than the other sensors. The origin of high response is discussed in detail. This new room temperature gas sensor can open a new aperture for development of gas sensors with minimum energy consumption which are compatible with silicon fabrication technology.
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