Abstract
Different deposition methods of nanocomposite silica films with embedded Y2O3:Eu3+, Tb3+ by atmospheric pressure plasma jet (APPJ) technology are presented. We found that a two-step strategy consisting in the APPJ deposition of a silica film on previously deposited nanophosphors is a very efficient method to obtain nanocomposite coatings with excellent adhesion to the substrate. Moreover the APPJ deposited silica film ensures protection of the luminescent nanoparticles and preserves the photoluminescence emission properties of the nanophosphors. Optically active coatings can be therefore deposited by using this technology.
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