InAlAs/InGaAs(P) double heterojunction bipolar transistors with high breakdown voltage grown by chemical beam epitaxy (CBE)

J.C Cowles,G.I Haddad,G.O Munns,W.L Chen

doi:10.1109/cornel.1993.303069

InAlAs/InGaAs(P) double heterojunction bipolar transistors with high breakdown voltage grown by chemical beam epitaxy (CBE)

J.C Cowles, G.I Haddad + Show 2 more

https://doi.org/10.1109/cornel.1993.303069

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Publication Date: Aug 2, 1993

Citations: 3

Affiliation: University of Michigan–Ann Arbor

#Double Heterojunction Bipolar Transistors #Chemical Beam Epitaxy + Show 8 more

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Abstract

InAlAs/InGaAs single(S) and double(D) heterojunction bipolar transistors (HBTs) have been grown by Chemical Beam Epitaxy (CBE). The DHBT features an InGaAsP precollector that greatly increases the breakdown voltage from 2V to 8V and decreases the collector emitter offset voltage from 360mV to 210mV in comparison to the SHBT. The common emitter current gain /spl beta/ remains high in both structures. Microwave measurements performed on the DHBT reveal that f/sub t/ increases monotonically with J/sub c/ up to at least 10/sup 5/ A/cm/sup 2/ showing no signs of base pushout. These results show that CBE grown DHBTs are promising devices for high power applications. >

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