Abstract
The present paper describes the inactivation of the external surfaces of mordenite and ZSM-5 zeolites using chemical vapor deposition (CVD) of Si(OCH 3) 4. The external surfaces of H mordenites with different Si/Al atomic ratios, Na mordenite, and HZSM-5 were deactivated by a silica layer. The silicon concentration required for the inactivation did not depend upon the included cation and the atomic ratio of Si/Al. Si(OCH 3) 4 reacted equivalently with terminal hydroxides and acidic hydroxides.
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