Abstract
We report a method of fabricating ultra-clean and hysteresis-free multiwall carbon nanotube field-effect transistors (CNFETs) inside the ultra-high vacuum transmission electron microscope equipped with a movable gold tip as a local gate. By tailoring the shell structure of the nanotube and varying the drain-source voltage (Vds), we can tune the electronic characteristic of a multiwall CNFET in situ. We have also found that the Schottky barriers of a multiwall CNFET are generated within the nanotube, but not at the nanotube/electrode contacts, and the barrier height has been derived. We have subsequently demonstrated the ambipolar characteristics of the CNFET with concurrent high-resolution imaging and local gating.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
