Abstract

We present an in-situ and real-time investigation of the formation of YHO and GdHO thin films grown by reactive e−-beam evaporation. Mass changes were continuously monitored during deposition, oxidation, and illumination using a highly sensitive quartz crystal microbalance, while changes in chemical composition and depth profiles were investigated simultaneously by ion beam analysis. Results highlight the strong reactivity of freshly deposited YHx and GdHx films, even under ultra-high vacuum conditions. Oxidation starts at the surfaces of the films and the oxidation rate is strongly dependent on the O2 pressure. The response of the system under ion beam irradiation and in-situ illumination is also presented and discussed. For the measured mass changes, a quantitative agreement better than 2% was observed between both techniques and demonstrates the consistency and sensitivity of this approach.

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