Abstract
We have developed a method of in situ reactive glow discharge cleaning of X-ray optical surfaces which is capable of complete removal of carbon contamination [E.D. Johnson et al., Rev. Sci. Instr. 58 (1987) 1042]. Our work is the first to successfully clean an entire optical system in situ and characterize its performance at short wavelengths (as low as 10 Å). The apparatus required is quite simple and can easily be fitted to most existing UHV (ultrahigh vacuum) mirror boxes or monochromators. The advantages of this technique over previously available methods include dramatic improvements in instrument performance and reductions in down time since the whole process typically takes a few days. This paper will briefly describe our results and detail the experimental considerations for application of the technique on different monochromator geometries. Possible improvements and extensions of the technique are also discussed.
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