Abstract
Thin Fe7C3 films were successfully prepared in an r.f. glow discharge using Fe(CO)5 and H2 as the gas source. The films showed a columnar crystal growth with a particle size less than 0.5 μm. The sheet conductivity of the films was in the range 1.0−5.0 × 104 ω−1 cm−1. The microhardness of the film on a glass substrate was 624.0 kgf mm−2. The Fe7C3 films formed on glass showed the presence of Fe7C3 and α-Fe phases after being annealed at 400 °C for 6 h. However, Fe3C (cementite) films formed on iron substrates. The influence of the H2O flow rate on the deposited films was investigated for both Fe(CO)5 + H2O and Fe(CO)5 + H2 + H2O systems.The plasma carburizing process was performed using either CO or a mixture of CO and H2 as the gas source and electrodeposited iron as the substrate. In the CO system, a carbon layer was formed as the main product while in the CO + H2 system, a homogeneous Fe3C film with a particle size of less than 0.5 μm and a microhardness of 479.0 kgf mm−2 was formed.
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