Abstract
A method of in situ optical monitoring of the CVD growth and reactive ion etching of nanodiamonds with silicon-vacancy colour centres is presented. The method is based on measuring the time dependence of the optical reflectivity from a silicon substrate with deposited isolated nanodiamonds. Evolution of the reflectivity due to the light scattering on nanodiamonds is a result of the changes in their size and structure during growth and etching. Optical monitoring of the growth and etching processes allowed reproducible fabrication of high crystalline quality nanodiamonds.
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