Abstract

AbstractPerovskite quantum dots (PQDs) are inherently unstable under environmental conditions, making it difficult to form patterns using conventional techniques. Herein, a unique approach is reported for patterning PQDs by the nonuniform photopolymerization of the liquid monomer. The demonstrated approach employs a PQD‐dispersed photocurable liquid, which is illuminated with the patterned light formed using a digital micromirror device (DMD). As the monomers are photopolymerized, the PQDs in the solution are patterned by diffusion (migration), and eventually, their pattern is imprinted on the film after photopolymerization. The migration process of the PQDs is in situ observed using an inverted‐type confocal microscope, and the patterning principle is examined by fine‐tuning the spatial distribution of the light intensity using the DMD. These findings will promote the generation of clear nanocrystal patterns with high contrasts and narrow line widths on films.

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