In Situ Generation of Hydrogen Peroxide Using Polymetallic-Doped g-C3N4 for Pollutant Removal

Liyan Wang,Liaoyuan Zhao,Qianhui Guo,Jiangnan Shou,Aojie Sun,Jianqing Ma,Liang Liu

doi:10.3390/app112210797

Liyan Wang, Liaoyuan Zhao + Show 5 more

Open Access

https://doi.org/10.3390/app112210797

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Abstract

Fenton reaction is a powerful technology for pollutants’ removal from water. However, the cost of H2O2 becomes one of the major stumbling blocks in its application. H2O2 has a relatively high price and is easily decomposed during transportation and use; therefore, in situ synthesis of H2O2 could improve economic benefits effectively. In this study, a Fe/Ni/Pd ternary metal-doped graphitic carbon nitride (FeNi-Pd@CN) is prepared, and in situ H2O2 generation using formic acid as hydrogen sources for organics removal was proved. The catalyst is advantageous, as H2O2 could accumulate to 1.69 mmol/L in 150 min when pumping air rather than oxygen gases in other studies. Furthermore, 92.0% of Acid Red 73 (200 mg/L) and 93.2% of tetracycline hydrochloride (10 mg/L) could be removed in 150 min without any pH adjustment. Characterization results show that the catalyst has good stability in metal leaching and reuse tests. It is proved that •OH and •O2− are the main reactive oxygen species, and a synergistic effect between Fe and Ni exists that enhances ROS generation for organics degradation. This work offers a promising method to remove refectory organic contaminants from industrial wastewater.

Highlights

Refractory organic contaminants in industrial wastewater are often intractable to the traditional wastewater system and harmful to the environment, their treatment technologies have attracted extensive attention worldwide
The morphology and structure of the as-synthesized FeNi-Pd@CN catalyst were firstly characterized by scanning electron microscopy (SEM) and high-resolution transmission electron microscopy (HRTEM) images
Palladium deposition on the surface of FeNi-Pd@CN could be observed in Figure 1b,c, as its crystalline interplanar spacing of 0.224 nm was assigned to Pd (111) plane [19]

Summary

Introduction

Refractory organic contaminants in industrial wastewater are often intractable to the traditional wastewater system and harmful to the environment, their treatment technologies have attracted extensive attention worldwide. Fenton reaction is viewed as a useful and feasible method to remove these pollutants [1]. The cost of H2 O2 is one of the major stumbling blocks in its application. It seems that the heterogeneous Fenton-like technology with low H2 O2 consumption could overcome these shortcomings and significantly improve the ability of water treatment [4]

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