In Situ Electrical Characteristics of 150 MeV Ag9+ Ion Beam Induced Damage in Si Photo Detector

Abstract

The effect of 150 MeV Ag9+ ion irradiation on electrical characteristics of Si photo detectors has been analyzed through in-situ Current voltage (I-V) and Capacitance voltage (C-V) measurements. Ideality factor (n), series resistance (Rs) and reverse leakage current (IR) are extracted from I-V characteristics. The value of n for pristine detector is found to be 1.24 and it has increased gradually along with the fluence. The value of IR for pristine is found to be 4.97 × 10−8 A and it increases to about three orders of magnitude at the fluence of 1 × 1013 ions/cm2 and further there is no observable change. Also, C-V characteristics exhibit considerable degradation. The value of capacitance decreased from 1.13 ×10−8 F to 3.97 × 10−10 F and also carrier concentration (NA) undergoes slight decrease with the increase in fluence. The 150 MeV Ag9+ ion induced displacements, vacancies in the bulk region mainly attribute to the observed degradation in the electrical characteristics. The ionization and displacement damage profiles were estimated from SRIM/TRIM (Stopping power and Range of Ion in Matter/Transport and Range of Ion in Matter) simulation codes. The observed degradations are explained in terms of TID (total ionization dose) and Dd (displacement damage dose).