Abstract
AbstractThe dehydration of hafnium oxide hydroxide sulfate thin films was studied using temperature programmed desorption (TPD) and X‐ray photoelectron spectroscopy. Films were found to desorb water up to 750 K with a maximum desorption rate at ~480 K. Carbon dioxide desorption was also observed in TPD measurements, which was related to contamination of precursor solutions and/or films by CO2 from the atmosphere. The O 1s spectra obtained for in‐situ annealed samples were fit with three components corresponding to Hf‐O, hydroxyl groups, and sulfate groups. Water TPD measurements from the dehydrated surface indicate the presence of two desorption states corresponding to molecularly and dissociatively adsorbed water. Copyright © 2013 John Wiley & Sons, Ltd.
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