Abstract
AbstractIn the paper in situ monitoring of the UV‐light‐ and thermal‐treatment of PMPSi thin films by real‐time spectroscopic ellipsometry and XPS is reported. The films were treated both under ultrahigh vacuum and oxygen atmosphere. The results of this study indicate that the SiSi bonds in the polymer main chain (Si‐backbone) were primarily broken at the UV‐light treatment. However, the Si radicals recombined into the polymer‐like chains causing no remarkable chemical shifts. The UV‐light treatment under enhanced sample temperature (≈80 °C) in oxygen atmosphere resulted in the more intense degradation of the PMPSi film. This can be related to cutting off the volatile methyl groups from the polymer main chains. Copyright © 2004 John Wiley & Sons, Ltd.
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