Abstract
Infrared absorption spectroscopy proves to be a useful tool in the evaluation of plasma chemical conversions of etch gas mixtures during plasma etching for microelectronics. The partial pressures of the various perfluorinated gas components are obtained from infrared spectra with sufficient accuracy and may yield information about the actual state of the system. Methods of spectra recording and partial pressure computation are discussed. To demonstrate the applicability of the method, the conversions of CF4 + O2, and C2F4 in a glow discharge are investigated.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
