Abstract
AbstractIn-plane magnetic anisotropy can be induced in Cr-underlayer/Co-alloy thin films by grooves or scratches in the substrate. To quantify this effect, silica substrates have been prepared with large areas of submicron grooves using interferometric lithography. The growth of Cr films and Cr/Co-alloy bilayer films on these substrates has been investigated, and in-plane magnetic anisotropy has been observed.
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