Abstract
The use of an in-line electrical metrology tool for evaluation and characterization of high-k dielectrics has been investigated. The equivalent oxide thickness obtained from the KLA-Tencor Quantox agrees well with high-frequency capacitance-voltage (C-V) results. The ACTIV Jg index parameter shows good correlation with the gate current obtained from C-V measurements. Therefore, this tool can be used as a fast and much less expensive evaluation tool for optimization of high-k process conditions and process stability monitoring. © 2003 The Electrochemical Society. All rights reserved.
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