Abstract
Impurity-free disordering (IFD) of the InAs quantum dots (QDs) capped with either an InP layer or an InGaAs∕InP bilayer is studied. The samples are coated with a SiO2 or TiO2 dielectric layer followed by rapid thermal annealing at 700, 750, 800, and 850°C for 30s. A large differential energy shift of 157meV is induced by SiO2 in the QDs capped with an InGaAs∕InP bilayer. Contrary to the reported results on the suppression of intermixing of GaAs based QDs by TiO2, the authors find that intermixing of InAs∕InP QDs is promoted by TiO2. X-ray photoelectron spectroscopy depth profiles show that both In and P outdiffuse to a TiO2 layer whereas Ga, In, and P outdiffuse to a SiO2 layer leading to different degrees of intermixing. The results indicate that a group V interstitial diffusion mechanism might be responsible for IFD of InAs∕InP QDs.
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