Abstract
We report a first-principles calculation of impurity effects on adhesion. C, O, B, and S impurities all cause a pronounced decrease in the adhesive energies of the Mo/${\mathrm{MoSi}}_{2}$(001) heterophase interface. S decreases the peak interfacial strength, while C, O, and B increase it. All impurities increase interfacial spacing in proportion to their covalent radii. Impurity mechanisms are identified.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.