Abstract
Oxygen, carbon and argon concentrations in chromium films produced by triode ion plating were studied as a function of substrate bias and cathode current density (or ion flux). The results reveal the following. (1) Ion plating with low bias and high ion flux can produce films with low oxygen and carbon concentrations. (2) At high bias, the effect of energetic particle bombardment on decreasing oxygen and carbon concentrations is not as effective as in low bias ion plating. (3) The amount of argon entrapped in the films increases with the increase in bias voltage and bombarding particle flux. A qualitative model based on the theory of energetic particle bombardment is used to explain the results.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
