Abstract
Alumina (Al2O3) films deposited through atomic layer deposition (ALD) are known to be effective permeation barriers due to their uniformity and pinhole-free morphology. However, they suffer from process-induced defects that inhibit their stability in aqueous and hygroscopic environments. We explore the water stability of ALD deposited alumina barrier films capped with nickel oxide (NiOx) and titanium oxide (TiOx) thin films deposited through e-beam or ALD deposition. The performance of the barriers was evaluated by measuring their ability to protect zinc oxide (ZnO) thin film sensors immersed in deionized (DI) water. X-ray photoelectron spectroscopy (XPS) was used to determine the composition of the barrier films with the various capping layers. The characteristic photoluminescence (PL) peak for the ZnO sensor was used as a marker to study changes in peak intensity due to degradation of the barrier films as a function of water immersion time. The TiOx capped films showed remarkable stability when immersed in DI water for 10 days. These results show that TiOx capping layers can offer superior protection to mitigate the water degradation of ALD alumina barrier films. Such composite laminates will enable a wider range of applications for ALD deposited alumina barrier films including aqueous environments.
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