Abstract
A sufficient oxidation resistance of RuAl thin films is crucial for their application in high temperature sensors e.g. based on the surface acoustic waves principle. To improve the high temperature stability, an Al2O3 or SiO2 cover layer is added to protect the films from oxidation especially for application in air. The covered RuAl films are annealed at temperatures up to 900 °C under high vacuum and in air for 10 h. X-ray diffraction, cross section imaging and Auger electron spectroscopy are applied to reveal the suitability of the cover layers as oxidation barrier. While there is hardly any difference between the samples with or without cover layer after annealing under high vacuum, only the samples with SiO2 cover are stable up to 800 °C in air.
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