Abstract
A series of permalloy (NiFe) thin films of fixed thickness were grown by DC-sputtering at different argon pressures and without buffer layers. When the pressure was lowered from 1.2Pa to 0.004Pa, the coercivity decreased remarkably form 1353.5A/m to 119.4A/m. In addition, the NiFe film fabricated at ultra-low-pressure showed low damping, and its zero-field linewidth approached zero. Based on ferromagnetic resonance (FMR) and atomic force microscopy (AFM) observations, we attribute the excellent magnetic properties of NiFe film fabricated under ultra-low pressure to its improved morphological and magnetic uniformity.
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