Abstract
We investigated annealing temperature $T_{a}$ dependence of tunnel magnetoresistance (TMR) ratio and magnetic properties for perpendicular-anisotropy (CoFe)100– X B X /MgO magnetic tunnel junctions (MTJs) with single (CoFe)100– X B X /MgO interface (s-MTJ) and double CoFeB–MgO interface (d-MTJ) structures with various boron compositions X. High TMR ratio over 100% was observed in the s-MTJ with $X= 35$ at.% after annealing at 360 °C–400 °C, whereas the s-MTJ with $X = 30$ at.% showed the degradation of TMR ratio with the increase of $T_{a}$ above 360 °C, resulting from the decrease of perpendicular anisotropy. The d-MTJ with $X = 25$ at.% maintained high TMR ratio up to $T_{a} = 400~^{\circ }\text{C}$ owing to its higher perpendicular anisotropy compared with the s-MTJ. The difference of perpendicular anisotropy between the s-MTJ and the d-MTJ can be attributed to higher interfacial anisotropy together with lower saturation magnetization of the d-MTJs. The lower saturation magnetization is attributable to two MgO layers that suppress boron diffusion from CoFeB layers, which was verified by cross-sectional line analysis using electron energy-loss spectroscopy.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
