Year-end Sale % OFF 
Abstract
By application of the PROMOTE technology in the DESIRE process the silicon profiles in the silylated images are improved. The method is based upon photochemical esterification that is limited to the upper part of the resist layer.An additional advantage is that a much lower imaging dose is required. Thus, not only is the silylation limited to the top, but also the imagewise exposure does not penetrate to the bottom.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
