Abstract
We have demonstrated efficient film oxidation of Nd:KGW [or Nd:KGd(WO4)2] films using a newly developed nozzle-gas-assisted pulsed-laser deposition (NGA-PLD) method. This technique is systematically studied and experimentally compared to the conventional PLD (C-PLD) method. A dramatic improvement in the film surface morphology is achieved with NGA-PLD. The NGA-PLD enables the efficient film oxidation under lower ambient pressures than the C-PLD technique, which realizes well-crystallized films with smoother surfaces. This simple technique will be very useful for fabrication of a variety of multi-component oxide films.
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