Abstract
AbstractWe have been proposing YMnO3 with low remanent polarization and permittivity as a ferroelectric gate transistor, and reported that c-oriented YMnO3 films were obtained on (111)Si with (111) oriented Y2O3 buffer layer. The ferroelectricity was confirmed by pulsed C-V measurement. However, the retention property was not satisfied because of its poor crystallinity. To improve the crystallinity of YMnO3 films, deposition conditions of Pulsed Laser Deposition (PLD) were optimized. The laser power, oxygen pressure and introducing Ozone gas are effective for maintaining the stoichiometry during the deposition. Improvement of the crystallinity of the YMnO3 film makes the retention property better. We also demonstrate the use of epitaxially grown Y2O3 buffer layer to improve the crystallinity of the YMnO3 films.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
