Improvement of plasma uniformity and mechanical properties of Cr films deposited on the inner surface of a tube by an auxiliary anode near the tube tail

Abstract

In order to improve the length of plasma in a whole tube and mechanical properties of Cr films deposited on the inner surface of the tube, a high-power impulse magnetron sputtering coating method with a planar cathode target and auxiliary anode was proposed. The auxiliary anode was placed near the tube tail to attract plasma into the inner part of the tube. Cr films were deposited on the inner wall of a 20# carbon steel tube with a diameter of 40 mm and length of 120 mm. The influence of auxiliary anode voltage on the discharge characteristics of the Cr target, and the structure and mechanical properties of Cr films deposited on the inner surface of the tube were explored. With higher auxiliary anode voltage, an increase in substrate current was observed, especially in the tube tail. The thickness uniformity, compactness, hardness and H/E ratios of the Cr films deposited on the inner surface of the tube increased with the increase in auxiliary anode voltage. The Cr films deposited with auxiliary anode voltage of 60 V exhibited the highest hardness of 9.6 GPa and the lowest friction coefficient of 0.68.