Abstract
The adherence of neurons on a silicon surface is the prerequisite of neurochips and implanted neural electrical devices. A study on neural cells cultured on the surface of modified silicon was designed, aiming to manufacture a mild interface between the neuron cells and the silicon-based electronic device. To improve the ability of neuron adherence, hydroxyl ion implantation was carried out. After 72 h culturing of the rat neuron, the development of neuronal synapses and the formation of a neural network connection were observed on the surface of silicon with medium fluence treatment under SEM, but no significance of cell adherence was shown on the control unimplanted silicon. After implantation of hydroxyl ion onto the silicon surface, the contact angle increased significantly showing improved hydrophilicity and the XPS results demonstrate the change of the Si–O bond, in concentration and structure.
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