Abstract
Heusler Co2FeSi films with a uniaxial magnetic anisotropy and high ferromagnetic resonance frequency fr were deposited by an oblique sputtering technique on Ru underlayers with various thicknesses tRu from 0 nm to 5 nm. It is revealed that the Ru underlayers reduce the grain size of Co2FeSi, dramatically enhance the magnetic anisotropy field HK induced by the internal stress from 242 Oe (1 Oe = 79.5775 A⋅m−1) to 582 Oe with an increment ratio of 2.4, while a low damping coefficient remains. The result of damping implies that the continuous interface between Ru and Co2FeSi induces a large in-plane anisotropic field without introducing additional external damping. As a result, excellent high-frequency soft magnetic properties with fr up to 6.69 GHz are achieved.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
