Abstract

In this study, Co, Cr, and Ni were selected as the equal-atomic medium entropy alloy (MEA) systems, and Si was added to form CoCrNiSi0.3 MEA. In order to further improve its wear and corrosion properties, CrN film was sputtered on the surface. In addition, to enhance the adhesion between the soft CoCrNiSi0.3 substrate and the super-hard CrN film, a Cr buffer layer was pre-sputtered on the CoCrNiSi0.3 substrate. The experimental results show that the CrN film exhibits a columnar grain structure, and the film growth rate is about 2.022 μm/h. With the increase of sputtering time, the increase in CrN film thickness, and the refinement of columnar grains, the wear and corrosion resistance improves. Among all CoCrNiSi0.3 MEAs without and with CrN films prepared in this study, the CoCrNiSi0.3 MEA with 3 h-sputtered CrN film has the lowest wear rate of 2.249 × 10-5 mm3·m-1·N-1, and the best corrosion resistance of Icorr 19.37 μA·cm-2 and Rp 705.85 Ω·cm2.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call