Abstract

An Al2O3/SiOx bi-layer cross-point selector was proposed and experimentally demonstrated in this work to mitigate the sneak path leakage issue in the high density passive crossbar array. A 2 nm Al2O3 interfacial layer confines filament dissolution gap caused by Ag diffusion into the SiOx layer, enabling significant improvement in uniformity and other electrical performances as compared to the monolayer SiOx selector (without Al2O3 layer). Devices with Al2O3 interfacial layer exhibit I-V characteristics with large selectivity of $> 5\times 10^{{7}}$ , high rectifying ratio ( RR ) of $> 5\times 10^{{7}}$ , high ON state current density of $> 10^{{3}}~\text{A}\cdot $ cm $^{\text {-2}}$ , steep slope subthreshold swing ( SS ) of $> 10~^{{4}}$ seconds were also demonstrated.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.